发明名称 |
SEMICONDUCTOR ARRANGEMENT AND FORMATION THEREOF |
摘要 |
A semiconductor arrangement and methods of formation are provided. A semiconductor arrangement includes a semiconductor column on a buffer layer over a substrate. The buffer layer comprises a conductive material. Both a first end of the semiconductor column and a bottom contact are connected to a buffer layer such that the first end of the semiconductor column and the bottom contact are connected to one another through the buffer layer, which reduces a contact resistance between the semiconductor column and the bottom contact. A second end of the semiconductor column is connected to a top contact. In some embodiments, the first end of the semiconductor column corresponds to a source or drain of a transistor and the second end corresponds to the drain or source of the transistor. |
申请公布号 |
US2017084752(A1) |
申请公布日期 |
2017.03.23 |
申请号 |
US201615342380 |
申请日期 |
2016.11.03 |
申请人 |
Taiwan Semiconductor Manufacturing Company Limited |
发明人 |
Vellianitis Georgios |
分类号 |
H01L29/786;H01L29/66;H01L21/8238;H01L29/423;H01L27/092 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
1. A semiconductor arrangement, comprising:
a buffer layer disposed over a portion of a substrate, the buffer layer comprising a conductive material; a plurality of semiconductor columns disposed over the buffer layer, wherein a first semiconductor column of the plurality of semiconductor columns is in contact with the buffer layer; a top contact disposed over the plurality of semiconductor columns and electrically coupled to the first semiconductor column; and a bottom contact in contact with the buffer layer and electrically coupled to the first semiconductor column through the buffer layer. |
地址 |
Hsin-Chu TW |