| 发明名称 |
TITANIUM-COMPOUND BASED HARD MASK FILMS |
| 摘要 |
Methods for forming a titanium-containing hard mask film on a substrate surface by exposing the substrate surface to a titanium-containing precursor. The titanium-containing hard mask comprises one or more of silicon, oxygen or carbon atoms and, optionally, nitrogen atoms. |
| 申请公布号 |
WO2017049267(A1) |
申请公布日期 |
2017.03.23 |
| 申请号 |
WO2016US52425 |
申请日期 |
2016.09.19 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
CHENG, Rui;TANG, Wei;MANNA, Pramit;MALLICK, Abhijit Basu;GANDIKOTA, Srinivas |
| 分类号 |
H01L21/033;G03F1/70;G03F1/76;H01L21/02 |
主分类号 |
H01L21/033 |
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