发明名称 A METHOD FOR FABRICATING A NANOSTRUCTURE
摘要 A method for fabricating a nanostructure comprises the steps of growing a first nanowire on a substrate, forming a dielectric layer on the substrate, the dielectric layer surrounding the first nanowire, wherein a thickness of the dielectric layer is smaller than a length of the first nanowire, and removing the first nanowire from the dielectric layer, thereby exposing an aperture in the dielectric layer.
申请公布号 WO2017046151(A1) 申请公布日期 2017.03.23
申请号 WO2016EP71672 申请日期 2016.09.14
申请人 TECHNISCHE UNIVERSITÄT MÜNCHEN 发明人 KOBLMÜLLER, Gregor;MAYER, Benedikt;FINLEY, Jonathan;ABSTREITER, Gerhard
分类号 H01L21/20;B82Y10/00;B82Y30/00;H01L33/18 主分类号 H01L21/20
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