发明名称 |
A METHOD FOR FABRICATING A NANOSTRUCTURE |
摘要 |
A method for fabricating a nanostructure comprises the steps of growing a first nanowire on a substrate, forming a dielectric layer on the substrate, the dielectric layer surrounding the first nanowire, wherein a thickness of the dielectric layer is smaller than a length of the first nanowire, and removing the first nanowire from the dielectric layer, thereby exposing an aperture in the dielectric layer. |
申请公布号 |
WO2017046151(A1) |
申请公布日期 |
2017.03.23 |
申请号 |
WO2016EP71672 |
申请日期 |
2016.09.14 |
申请人 |
TECHNISCHE UNIVERSITÄT MÜNCHEN |
发明人 |
KOBLMÜLLER, Gregor;MAYER, Benedikt;FINLEY, Jonathan;ABSTREITER, Gerhard |
分类号 |
H01L21/20;B82Y10/00;B82Y30/00;H01L33/18 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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