| 摘要 |
A method for cleaning a wafer with an ozonated water, comprising: putting a wafer (3) horizontally in an immersion tray (4) provided with a liquid discharge port (6) in the bottom; supplying ozonated water (2) to the immersion tray (4) through a supply pipe (1) placed above the wafer (3); immersing the wafer (3) in the ozonated water (2) in the immersion tray (4) and thus cleaning the wafer (3); and discharging the resulting ozonated water (2) through the liquid discharge port (6). Thus, a cleaning method which uses ozonated water and enables cleaning with a small amount of a low-concentration ozonated water and which causes no cleaning unevenness and can dispense with a complicated device configuration is provided. |
