| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for designing a semiconductor device capable of relatively correctly grasping the dimensions of a transferred pattern without exerting an adverse effect on device characteristics or the like.SOLUTION: The method for designing a semiconductor device comprises: a step S1 of layouting a device pattern; a step S5 of layouting a monitor pattern based on the device pattern within a region including a part as the check object of the dimensions of the device pattern; and a step of layouting a dummy pattern to a region adjacent to a region in which a monitor pattern is layouted. In the step in which the dummy pattern is layouted, the dummy pattern is layouted in such a manner that a difference between the dimensions of the part as the check object of the transferred device pattern and the dimensions of the transferred monitor pattern is controlled to an allowable value or lower. |
