发明名称 マスクブランク、位相シフトマスク、これらの製造方法、および半導体デバイスの製造方法
摘要 PROBLEM TO BE SOLVED: To provide a mask blank capable of suppressing occurrence of a transfer failure even when a translucent substrate has minute concave defective parts.SOLUTION: Provided is a mask blank comprising a phase shift film disposed on a main surface of a translucent substrate. The translucent substrate has concave defective parts on the main surface on which the phase shift film is formed. The phase shift film includes a structure where, from a side of the translucent substrate, a high-transmission layer and a low-transmission layer having lower light transmittance than the former are laminated in this order. Inner regions of the high transmission layer formed on the concave defective parts have low-density regions, where density in the low-density region is relatively lower than that in an inner region of the high-transmission layer formed on the main surface which is free from the concave defective parts.
申请公布号 JP6100096(B2) 申请公布日期 2017.03.22
申请号 JP20130112549 申请日期 2013.05.29
申请人 HOYA株式会社 发明人 宍戸 博明;酒井 和也
分类号 G03F1/32;G03F1/72 主分类号 G03F1/32
代理机构 代理人
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