| 摘要 |
PROBLEM TO BE SOLVED: To provide a sample processing method using a focused ion beam device capable of processing a sample smoothly in a large region on the sample, which cannot be viewed within one view field in observing and processing, by enabling highly accurate continuous and iterative processing and a series of integrated processing of a processing pattern in the large region on the sample.SOLUTION: In a sample processing method, an image of a processing pattern is obtained as a reference image for alignment from the processing pattern subjected to sample processing within a view field 610 or 620 including a processing start position 611 of the processing pattern 26 in a large region 601. A sample stage is moved based on sample processing information registered in advance so that a processing position for the next processing pattern in the large region is included in the view field. The image of the processing pattern is obtained from the moved sample as a comparison image for alignment. The image of the processing pattern of the reference image is compared with the image of the processing pattern of the comparison image to correct the processing position of the next processing pattern in the large region within the view field. |
