发明名称 半導体装置
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device including a LOCOS offset field effect transistor having a high withstanding voltage and low resistance.SOLUTION: In a LOCOS offset field effect transistor having a high withstanding voltage, by forming a first offset diffusion layer on a drain side and a second offset diffusion layer at a contact part of a high-concentration diffusion layer, and achieving low resistance and relax of an electric field at a junction part, and forming a rectangular contact in planar view at an end of a LOCOS oxide film on the high-concentration diffusion layer side, current concentration is relaxed thereby to enable the LOCOS offset field effect transistor having a high withstanding voltage and low resistance to be provided.
申请公布号 JP6099956(B2) 申请公布日期 2017.03.22
申请号 JP20120269759 申请日期 2012.12.10
申请人 エスアイアイ・セミコンダクタ株式会社 发明人 北島 裕一郎
分类号 H01L21/336;H01L21/768;H01L23/522;H01L29/41;H01L29/417;H01L29/78 主分类号 H01L21/336
代理机构 代理人
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