Method of manufacturing semiconductor device

摘要

An improvement is achieved in the performance of a semiconductor device. In a method of manufacturing the semiconductor device, in an n-type semiconductor substrate, a p-type well as a p-type semiconductor region forming a part of a photodiode is formed and a gate electrode of a transfer transistor is formed. Then, after an n-type well as an n-type semiconductor region forming the other part of the photodiode is formed, a microwave is applied to the semiconductor substrate to heat the semiconductor substrate. Thereafter, a drain region of the transfer transistor is formed.

主权项

1. A method of manufacturing a semiconductor device, comprising steps of:
(a) providing a semiconductor substrate having a first conductivity type; (b) after the step (a), implanting second conductivity type impurities and forming, in the semiconductor substrate, a first semiconductor region having a second conductivity type opposite to the first conductivity type, thereby forming a part of a photodiode; (c) after the step (b), applying a microwave to the semiconductor substrate to heat the semiconductor substrate; (d) after step (c), forming, over the semiconductor substrate, a gate electrode of a transfer transistor which transfers charges generated by the photodiode; (e) after the step (d), implanting first conductivity type impurities and forming a second semiconductor region having the first conductivity type, thereby forming another part of the photodiode such that the second semiconductor region is contained by the first semiconductor region; (f) after the step (e), forming, in the semiconductor substrate, a drain region of the transfer transistor; (g) after the step (f) performing an activation annealing by thermal annealing at a temperature not less than 800° C. to activate the first conductivity type impurities and the second conductivity type impurities implanted in steps (b) and (c): (h) after the step (g), forming a first interlayer insulating film over the semiconductor substrate; (i) after the step (h), forming a contact hole in the interlayer insulating film to reach the drain region; (j) after the step (i), forming a plug including a conductive film in the contact hole; and (k) after the step (j), forming a second interlayer insulating film over the first interlayer insulating film and the plug.