发明名称 |
One-time programmable memory cell capable of reducing leakage current and preventing slow bit response, and method for programming a memory array comprising the same |
摘要 |
A one time programmable (OTP) memory cell includes a select gate transistor, a following gate transistor, and an antifuse varactor. The select gate transistor has a first gate terminal, a first drain terminal and a first source terminal. The following gate transistor has a second gate terminal, a second drain terminal and a second source terminal coupled to the first drain terminal. The antifuse varactor has a third gate terminal, a third drain terminal, and a third source terminal coupled to the second drain terminal. The select gate transistor, the following gate transistor, and the antifuse varactor are formed on a substrate structure. |
申请公布号 |
US9601499(B2) |
申请公布日期 |
2017.03.21 |
申请号 |
US201615005012 |
申请日期 |
2016.01.25 |
申请人 |
eMemory Technology Inc. |
发明人 |
Wu Meng-Yi;Wong Wei-Zhe;Chen Hsin-Ming |
分类号 |
G11C17/14;H01L27/112;G11C17/16;H01L29/78;H01L27/10;G11C17/18;H01L23/525 |
主分类号 |
G11C17/14 |
代理机构 |
|
代理人 |
Hsu Winston;Margo Scott |
主权项 |
1. A one time programmable (OTP) memory cell, comprising:
a substrate structure; a shallow trench insulation area adjoining the substrate structure; a select gate transistor formed on the substrate structure, the select gate transistor having a first gate terminal, a first drain terminal, and a first source terminal; a following gate transistor formed on the substrate structure, the following gate transistor having a second gate terminal, a second drain terminal, and a second source terminal coupled to the first drain terminal; an antifuse varactor formed on the substrate structure, the antifuse varactor having a third gate terminal, a third drain terminal, and a third source terminal coupled to the second drain terminal; and a dummy transistor partially formed on the substrate structure, the dummy transistor having a fourth gate terminal, and a fourth source terminal coupled to the third drain terminal; wherein a part of the fourth gate terminal is formed above the shallow trench insulation area. |
地址 |
Hsin-Chu TW |