发明名称 Foreign substance detection method, foreign substance detection apparatus, exposure method, and method of manufacturing device
摘要 A foreign substance detection method includes: judging the presence/absence of a foreign substance by measuring a surface condition of a substrate; measuring a surface condition of a second substrate different from the substrate upon replacing the substrate on the chuck with the second substrate, when it is judged in the judging that a foreign substance exists; and determining whether an adhering location of the foreign substance determined to exist in the judging is the substrate, based on a measurement result obtained in the measurement.
申请公布号 US9599903(B2) 申请公布日期 2017.03.21
申请号 US201414533733 申请日期 2014.11.05
申请人 CANON KABUSHIKI KAISHA 发明人 Nakamura Tadao;Kosugi Yuji;Nakazawa Tomohisa
分类号 G01N21/00;G03B27/32;G03B27/52;G03F7/20;G01N21/95;G01N21/94;G03F9/00;G01S17/48 主分类号 G01N21/00
代理机构 Rossi, Kimms & McDowell LLP 代理人 Rossi, Kimms & McDowell LLP
主权项 1. A method of detecting presence/absence of a foreign substance on a substrate held on a stage through a chuck, the method comprising: a judging step of judging the presence/absence of a foreign substance by measuring a surface condition of the substrate; a measurement step of measuring a surface condition of a second substrate different from the substrate upon replacing the substrate on the chuck with the second substrate, when it is judged in the judging step that a foreign substance exists; and a determination step of determining whether an adhering location of the foreign substance determined to exist in the judging step is the substrate, based on a measurement result obtained in the measurement step.
地址 Tokyo JP