发明名称 |
Foreign substance detection method, foreign substance detection apparatus, exposure method, and method of manufacturing device |
摘要 |
A foreign substance detection method includes: judging the presence/absence of a foreign substance by measuring a surface condition of a substrate; measuring a surface condition of a second substrate different from the substrate upon replacing the substrate on the chuck with the second substrate, when it is judged in the judging that a foreign substance exists; and determining whether an adhering location of the foreign substance determined to exist in the judging is the substrate, based on a measurement result obtained in the measurement. |
申请公布号 |
US9599903(B2) |
申请公布日期 |
2017.03.21 |
申请号 |
US201414533733 |
申请日期 |
2014.11.05 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
Nakamura Tadao;Kosugi Yuji;Nakazawa Tomohisa |
分类号 |
G01N21/00;G03B27/32;G03B27/52;G03F7/20;G01N21/95;G01N21/94;G03F9/00;G01S17/48 |
主分类号 |
G01N21/00 |
代理机构 |
Rossi, Kimms & McDowell LLP |
代理人 |
Rossi, Kimms & McDowell LLP |
主权项 |
1. A method of detecting presence/absence of a foreign substance on a substrate held on a stage through a chuck, the method comprising:
a judging step of judging the presence/absence of a foreign substance by measuring a surface condition of the substrate; a measurement step of measuring a surface condition of a second substrate different from the substrate upon replacing the substrate on the chuck with the second substrate, when it is judged in the judging step that a foreign substance exists; and a determination step of determining whether an adhering location of the foreign substance determined to exist in the judging step is the substrate, based on a measurement result obtained in the measurement step. |
地址 |
Tokyo JP |