Reflective lithography masks and systems and methods

摘要

Various non-planar reflective lithography masks, systems using such lithography masks, and methods are disclosed. An embodiment is a lithography mask comprising a transparent substrate, a reflective material, and a reticle pattern. The transparent substrate comprises a curved surface. The reflective material adjoins the curved surface of the transparent substrate, and an interface between the reflective material and the transparent substrate is a reflective surface. The reticle pattern is on a second surface of the transparent substrate. A reflectivity of the reticle pattern is less than a reflectivity of the reflective material. Methods for forming similar lithography masks and for using similar lithography masks are disclosed.

主权项

1. A method of forming a photomask, the method comprising:
forming a first reflective material on a convex surface of a transparent substrate; forming a patterned mask layer on a concave surface of the transparent substrate, the patterned mask layer having openings; forming a reticle pattern within the openings of the patterned mask layer, the reticle pattern comprising a second reflective material; and removing the patterned mask layer.