Method of fabricating sputtering target, sputtering target using the method, and method of manufacturing organic light-emitting display apparatus using the sputtering target

摘要

A method of fabricating a sputtering target includes preparing a first powder material including at least one of a tin oxide and a mesh-forming oxide; mixing the first powder material and a second powder material comprising carbon or a tin oxide to prepare a mixture; simultaneously performing a primary compression and primary sintering on the mixture in a reduction atmosphere; and simultaneously performing a secondary compression and secondary sintering on the mixture in the reduction atmosphere to prepare the sputtering target.

主权项

1. A method of fabricating a sputtering target, the method comprising:
preparing a first powder material comprising at least one of a tin oxide and Sn2P2O7; mixing the first powder material and a second powder material to prepare a mixture, wherein the second powder material comprises carbon or a tin oxide; simultaneously performing a primary compression and a primary heating on the mixture in a reduction atmosphere; and simultaneously performing a secondary compression and a secondary heating on the mixture in the reduction atmosphere to prepare the sputtering target, wherein the primary heating is performed at a temperature of about 100° C. to about 550° C. and the secondary heating is performed at a temperature of about 150° C. to about 450° C.