Methods for working and sensing synthetic quartz glass substrate

摘要

A synthetic quartz glass substrate having front and back surfaces is worked by lapping, etching, mirror polishing, and cleaning steps for thereby polishing the front surface of the substrate to a mirror-like surface. The etching step is carried out using a hydrofluoric acid solution at pH 4-7.

主权项

1. A method for working a synthetic quartz glass substrate, comprising the steps, in the recited order, of lapping, etching, mirror polishing, and cleaning the synthetic quartz glass substrate having front and back surfaces for thereby polishing the front surface to a mirror-like surface,
wherein, in the etching step, etching of the front and back surfaces of the synthetic quartz glass substrate is performed with hydrofluoric acid or buffered hydrofluoric acid at pH 4 to 7, and wherein a heat treatment in a heating furnace is carried out between the etching step and the mirror polishing step.