发明名称 |
Ion sensor |
摘要 |
The disclosure describes techniques for determining an ion concentration in a sample. According to these techniques of this disclosure, an ion concentration of a sample is determined based on detecting at least one change in an electrical characteristic of a semiconductor device due to a gate insulation layer of the semiconductor device placed in contact with the sample. |
申请公布号 |
US9599586(B2) |
申请公布日期 |
2017.03.21 |
申请号 |
US201213595019 |
申请日期 |
2012.08.27 |
申请人 |
Infineon Technologies AG |
发明人 |
Krivec Stefan;Schagerl Guenter |
分类号 |
G01N27/62;G01N27/414 |
主分类号 |
G01N27/62 |
代理机构 |
Murphy, Bilak & Homiller, PLLC |
代理人 |
Murphy, Bilak & Homiller, PLLC |
主权项 |
1. An apparatus for determining an ion concentration in a sample, comprising:
a semiconductor body; a gate electrode; a gate insulation arranged between the gate electrode and at least a portion of the semiconductor body, wherein the gate insulation comprises at least one ion access area providing access for ions in the sample to the insulating layer, wherein the gate electrode is in direct contact with the gate insulation, wherein the gate electrode is embedded in the gate insulation so that a top surface of the gate electrode and a top surface of the gate insulation are coplanar. |
地址 |
Neubiberg DE |