发明名称 Method of fabricating a polishing
摘要 Polishing pads with apertures are described. Methods of fabricating polishing pads with apertures are also described.
申请公布号 US9597770(B2) 申请公布日期 2017.03.21
申请号 US201414550129 申请日期 2014.11.21
申请人 NexPlanar Corporation 发明人 Allison William C.;Scott Diane;Bajaj Rajeev
分类号 B24D18/00;B24B37/20;B24B37/22;B24B37/26;B24B37/005;B24B49/12 主分类号 B24D18/00
代理机构 代理人 Omholt Thomas;Wilson Erika;Brask Justin
主权项 1. A method of fabricating a polishing pad for polishing a substrate, the method comprising: mixing a set of polymerizable materials to form a mixture in a base of a formation mold; moving a lid of the formation mold into the mixture, the lid having disposed thereon a pattern of protrusions and an aperture protrusion with a height greater than the pattern of protrusions; and, with the lid placed in the mixture, at least partially curing the mixture to form a molded homogeneous polishing body comprising a back surface and a polishing surface having disposed therein a pattern of grooves and an opening defining an aperture region.
地址 Hillsboro OR US