发明名称 |
Method of fabricating a polishing |
摘要 |
Polishing pads with apertures are described. Methods of fabricating polishing pads with apertures are also described. |
申请公布号 |
US9597770(B2) |
申请公布日期 |
2017.03.21 |
申请号 |
US201414550129 |
申请日期 |
2014.11.21 |
申请人 |
NexPlanar Corporation |
发明人 |
Allison William C.;Scott Diane;Bajaj Rajeev |
分类号 |
B24D18/00;B24B37/20;B24B37/22;B24B37/26;B24B37/005;B24B49/12 |
主分类号 |
B24D18/00 |
代理机构 |
|
代理人 |
Omholt Thomas;Wilson Erika;Brask Justin |
主权项 |
1. A method of fabricating a polishing pad for polishing a substrate, the method comprising:
mixing a set of polymerizable materials to form a mixture in a base of a formation mold; moving a lid of the formation mold into the mixture, the lid having disposed thereon a pattern of protrusions and an aperture protrusion with a height greater than the pattern of protrusions; and, with the lid placed in the mixture, at least partially curing the mixture to form a molded homogeneous polishing body comprising a back surface and a polishing surface having disposed therein a pattern of grooves and an opening defining an aperture region. |
地址 |
Hillsboro OR US |