发明名称 Wiring substrate, manufacturing method therefor, and semiconductor package
摘要 A wiring substrate includes a heat radiation plate and a substrate provided on the heat radiation plate interposed by an adhesive layer. The substrate includes a first surface on which the adhesive layer is provided and a second surface on an opposite side of the first surface. The wiring substrate also includes a wiring provided on the second surface of the substrate, and a notch part that penetrates the substrate in a thickness direction of the substrate, with the notch part being formed by notching the wiring substrate inward from an outer edge part of the substrate from a plan view. The adhesive layer covers an end surface of the substrate that is exposed in an inner wall surface of the notch part.
申请公布号 US9603253(B2) 申请公布日期 2017.03.21
申请号 US201514591239 申请日期 2015.01.07
申请人 SHINKO ELECTRIC INDUSTRIES CO., LTD. 发明人 Denda Tatsuaki;Kobayashi Toshio;Horikawa Yasuyoshi;Shimizu Hiroshi
分类号 H05K1/18;H05K1/02 主分类号 H05K1/18
代理机构 IPUSA, PLLC 代理人 IPUSA, PLLC
主权项 1. A wiring substrate comprising: a heat radiation plate; a substrate provided on the heat radiation plate interposed by an adhesive layer, the substrate including a first surface on which the adhesive layer is provided, and a second surface on an opposite side of the first surface; a wiring provided on the second surface of the substrate; and a notch part that penetrates the substrate in a thickness direction of the substrate, the notch part being formed by notching the substrate inward from an outer edge part of the substrate from a plan view, wherein the adhesive layer covers an end surface of the substrate that is exposed in an inner wall surface of the notch part.
地址 Nagano JP