发明名称 |
Wiring substrate, manufacturing method therefor, and semiconductor package |
摘要 |
A wiring substrate includes a heat radiation plate and a substrate provided on the heat radiation plate interposed by an adhesive layer. The substrate includes a first surface on which the adhesive layer is provided and a second surface on an opposite side of the first surface. The wiring substrate also includes a wiring provided on the second surface of the substrate, and a notch part that penetrates the substrate in a thickness direction of the substrate, with the notch part being formed by notching the wiring substrate inward from an outer edge part of the substrate from a plan view. The adhesive layer covers an end surface of the substrate that is exposed in an inner wall surface of the notch part. |
申请公布号 |
US9603253(B2) |
申请公布日期 |
2017.03.21 |
申请号 |
US201514591239 |
申请日期 |
2015.01.07 |
申请人 |
SHINKO ELECTRIC INDUSTRIES CO., LTD. |
发明人 |
Denda Tatsuaki;Kobayashi Toshio;Horikawa Yasuyoshi;Shimizu Hiroshi |
分类号 |
H05K1/18;H05K1/02 |
主分类号 |
H05K1/18 |
代理机构 |
IPUSA, PLLC |
代理人 |
IPUSA, PLLC |
主权项 |
1. A wiring substrate comprising:
a heat radiation plate; a substrate provided on the heat radiation plate interposed by an adhesive layer, the substrate including a first surface on which the adhesive layer is provided, and a second surface on an opposite side of the first surface; a wiring provided on the second surface of the substrate; and a notch part that penetrates the substrate in a thickness direction of the substrate, the notch part being formed by notching the substrate inward from an outer edge part of the substrate from a plan view, wherein the adhesive layer covers an end surface of the substrate that is exposed in an inner wall surface of the notch part. |
地址 |
Nagano JP |