发明名称 Electronic device and method of manufacturing semiconductor device
摘要 There is provided an electronic device including at least a first electrode, a second electrode disposed to be spaced apart from the first electrode, and an active layer disposed over the second electrode from above the first electrode and formed of an organic semiconductor material. A charge injection layer is formed between the first electrode and the active layer and between the second electrode and the active layer, and the charge injection layer is formed of an organic material having an increased electric conductivity when the charge injection layer is oxidized.
申请公布号 US9601596(B2) 申请公布日期 2017.03.21
申请号 US201414338477 申请日期 2014.07.23
申请人 SONY CORPORATION 发明人 Katsuhara Mao
分类号 H01L51/40;H01L29/66;H01L51/05;H01L51/00 主分类号 H01L51/40
代理机构 Hazuki International, LLC 代理人 Hazuki International, LLC
主权项 1. A method of manufacturing a semiconductor device, comprising: forming a gate electrode on a base; forming a gate insulating layer on the base and the gate electrode; forming a channel formation region and channel extension regions of an organic semiconductor material on the gate insulating layer; forming charge-injection precursor layers of an organic compound on the channel extension regions; performing oxidation on the charge-injection precursor layers to form charge-injection layers; and forming a pair of source/drain electrodes above the channel extension regions and charge-injection layers, wherein the organic compound comprises at least one organic compound selected from the group consisting of: a Weitz type oxidation-reduction based organic compound, an organic compound having a cyclic structure in which the number of π electrons is 4n+3 (n is a positive integer), an organic compound having a dichalcogen five-membered ring, and an organic compound having a monochalcogen six-membered ring.
地址 Tokyo JP