发明名称 Thin film transistor and manufacturing method thereof, array substrate and manufacturing method thereof, and display device
摘要 A thin film transistor and a manufacturing method thereof, an array substrate and a manufacturing method thereof, and a display device are provided. The array substrate comprises: a base substrate and an electrode arranged on the base substrate. The electrode comprises: an aluminum layer or an aluminum alloy layer on the base substrate; and a first barrier layer arranged on the aluminum layer or the aluminum alloy layer and configured for preventing the aluminum layer or the aluminum alloy layer from producing hillocks. The array substrate can eliminate bad phenomenon that the metal aluminum or aluminum alloy formed on the base substrate produces hillocks when subjected to high temperature.
申请公布号 US9601338(B2) 申请公布日期 2017.03.21
申请号 US201414429279 申请日期 2014.07.31
申请人 BOE Technology Group Co., Ltd. 发明人 Kong Xiangyong;Sun Hongda
分类号 H01L21/02;H01L21/283;H01L27/12;H01L21/77;H01L29/45;H01L29/49;H01L21/311;H01L27/32;H01L29/417;H01L29/423;H01L29/51;H01L29/66;H01L29/786;G02F1/1362 主分类号 H01L21/02
代理机构 Banner & Witcoff, Ltd. 代理人 Banner & Witcoff, Ltd.
主权项 1. A thin film transistor, comprising a base substrate and an electrode arranged on the base substrate, wherein the electrode comprises: an aluminum layer or an aluminum alloy layer, arranged on the base substrate; a first barrier layer, arranged on the aluminum layer or the aluminum alloy layer, and configured for preventing the aluminum layer or the aluminum alloy layer from producing hillocks; a second barrier layer arranged between the base substrate and the aluminum layer or the aluminum alloy layer and configured for preventing the aluminum layer or the aluminum alloy layer from producing hillocks, wherein the second barrier layer comprises an aluminum composite layer doped with nitrogen ions which conducts electricity; and a third barrier layer arranged between the aluminum layer or the aluminum alloy layer and the first barrier layer, wherein the third barrier layer and the first barrier layer comprise a same element aluminum.
地址 Beijing CN