发明名称 |
LIQUID CRYSTAL DISPLAY DEVICE AND METHOD OF MANUFACTURING THAT |
摘要 |
A liquid crystal display device includes a first substrate, a first alignment film formed over the first substrate, a second substrate, a second alignment film formed over the second substrate, a liquid crystal layer sandwiched between the first alignment film and the second alignment film, and a projecting portion formed over the second substrate. The first alignment film is a photo alignment film, and a thickness “d2” of the second alignment film over the projecting portion and a film thickness “d1” of a portion of the first alignment film facing the projecting portion satisfy formula (1) and (2):;0 nm<d2<30 nm (1);;d2<d1 (2). |
申请公布号 |
US2017075172(A1) |
申请公布日期 |
2017.03.16 |
申请号 |
US201615360595 |
申请日期 |
2016.11.23 |
申请人 |
Japan Display Inc. ;Panasonic Liquid Crystal Display Co., Ltd. |
发明人 |
SONODA Hidehiro;Matsui Chikae;Kunimatsu Noboru |
分类号 |
G02F1/1337;G02F1/1343;G02F1/1368;G02F1/1339;G02F1/1333;G02F1/1362 |
主分类号 |
G02F1/1337 |
代理机构 |
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代理人 |
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主权项 |
1. A liquid crystal display device comprising:
a first substrate; a first alignment film formed on the first substrate; a second substrate; a second alignment film formed on the second substrate; a liquid crystal layer sandwiched between the first alignment film and the second alignment film; a projecting portion formed on the second substrate; a facing portion formed on the first substrate; a first electrode formed in a pixel region, the first electrode formed between the first alignment film and the first substrate; and an insulation film formed between the first substrate and the liquid crystal layer, wherein the first electrode and the insulation film is covered by the first alignment film, wherein the facing portion faces the projecting portion, wherein the first alignment film or the second alignment film is a photo alignment film, and wherein a thickness “d2” of the second alignment film on the projecting portion and a thickness “d1” of the first alignment film on the first electrode formula (1) and (2),
0 nm<d2<30 nm (1),d2<d1 (2). |
地址 |
Tokyo JP |