发明名称 |
LOW CONTRAST SILICON NITRIDE-BASED METASURFACES |
摘要 |
Disclosed herein are metasurfaces formed on a substrate from a plurality of posts. The metasurfaces are configured to be optically active at one or more wavelengths and in certain embodiments are configured to form lenses having unexpectedly strong focusing power. In particular, the metasurfaces are formed from "low-contrast" materials, including CMOS-compatible materials such as silicon dioxide or silicon nitride. Accordingly, the disclosed metasurfaces are generally CMOS compatible and therefore embody a new paradigm in metasurface design and manufacturing. |
申请公布号 |
WO2017044637(A1) |
申请公布日期 |
2017.03.16 |
申请号 |
WO2016US50793 |
申请日期 |
2016.09.08 |
申请人 |
UNIVERSITY OF WASHINGTON |
发明人 |
ZHAN, Alan;COLBURN, Shane;MAJUMDAR, Arka |
分类号 |
G02B5/18;G02F1/01;H01Q15/14 |
主分类号 |
G02B5/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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