发明名称 |
THIN FILM TRANSISTOR ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF |
摘要 |
A substrate including gate wirings including gate line and a gate electrode disposed on the substrate, a storage line disposed on the same layer as the gate wirings, a gate insulating layer disposed on the gate wirings and the storage line, an oxide semiconductor layer pattern disposed on the gate insulating layer, data wirings including a data line crossing the gate line, a source electrode disposed on one side of the oxide semiconductor layer pattern, and a drain electrode disposed on another side of the oxide semiconductor layer, and an etch stopper including a first etch stopper portion disposed between the storage line and the data line and partially overlapping both the data line and the storage line. |
申请公布号 |
US2017077144(A1) |
申请公布日期 |
2017.03.16 |
申请号 |
US201615342756 |
申请日期 |
2016.11.03 |
申请人 |
Samsung Display Co., Ltd. |
发明人 |
LEE Young-Wook;LEE Woo-Geun;KIM Ki-Won;LEE Hyun-Jung;OH Ji-Soo |
分类号 |
H01L27/12;H01L21/768 |
主分类号 |
H01L27/12 |
代理机构 |
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代理人 |
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主权项 |
1. A substrate, comprising:
gate wirings comprising a gate line and a gate electrode disposed on the substrate; a storage line disposed on the same layer as the gate wirings; a gate insulating layer disposed on the gate wirings and the storage line; an oxide semiconductor layer pattern disposed on the gate insulating layer; data wirings comprising a data line crossing the gate line, a source electrode disposed on one side of the oxide semiconductor layer pattern, and a drain electrode disposed on another side of the oxide semiconductor layer pattern; and an etch stopper comprising a first etch stopper portion, the first etch stopper portion disposed between the storage line and the data line and partially overlapping both the data line and the storage line. |
地址 |
Yongin-si KR |