发明名称 THIN FILM TRANSISTOR ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF
摘要 A substrate including gate wirings including gate line and a gate electrode disposed on the substrate, a storage line disposed on the same layer as the gate wirings, a gate insulating layer disposed on the gate wirings and the storage line, an oxide semiconductor layer pattern disposed on the gate insulating layer, data wirings including a data line crossing the gate line, a source electrode disposed on one side of the oxide semiconductor layer pattern, and a drain electrode disposed on another side of the oxide semiconductor layer, and an etch stopper including a first etch stopper portion disposed between the storage line and the data line and partially overlapping both the data line and the storage line.
申请公布号 US2017077144(A1) 申请公布日期 2017.03.16
申请号 US201615342756 申请日期 2016.11.03
申请人 Samsung Display Co., Ltd. 发明人 LEE Young-Wook;LEE Woo-Geun;KIM Ki-Won;LEE Hyun-Jung;OH Ji-Soo
分类号 H01L27/12;H01L21/768 主分类号 H01L27/12
代理机构 代理人
主权项 1. A substrate, comprising: gate wirings comprising a gate line and a gate electrode disposed on the substrate; a storage line disposed on the same layer as the gate wirings; a gate insulating layer disposed on the gate wirings and the storage line; an oxide semiconductor layer pattern disposed on the gate insulating layer; data wirings comprising a data line crossing the gate line, a source electrode disposed on one side of the oxide semiconductor layer pattern, and a drain electrode disposed on another side of the oxide semiconductor layer pattern; and an etch stopper comprising a first etch stopper portion, the first etch stopper portion disposed between the storage line and the data line and partially overlapping both the data line and the storage line.
地址 Yongin-si KR