发明名称 SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 A semiconductor memory device according to an embodiment includes a first semiconductor layer containing an acceptor and a memory cell array including an interlayer insulating layer and a conductive layer arranged in a first direction above the first semiconductor layer and a memory columnar body extending in the first direction and having a lower end positioned lower than a position of a top surface of the first semiconductor layer, the memory columnar body containing a second semiconductor layer in a columnar shape having a side face opposite to a side face of the conductive layer, wherein a first portion of the first semiconductor layer in contact with the side face of the memory columnar body contains a donor in a higher concentration than a second portion different from the first portion of the first semiconductor substrate.
申请公布号 US2017077121(A1) 申请公布日期 2017.03.16
申请号 US201514971310 申请日期 2015.12.16
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 SATO Mitsuru;Kobayashi Shigeki;Murase Tsutomu
分类号 H01L27/115;H01L21/225;H01L29/08;H01L29/167;H01L29/10 主分类号 H01L27/115
代理机构 代理人
主权项 1. A semiconductor memory device comprising: a first semiconductor layer containing an acceptor; and a memory cell array including an interlayer insulating layer and a conductive layer arranged in a first direction above the first semiconductor layer and a memory columnar body extending in the first direction and having a lower end positioned lower than a position of a top surface of the first semiconductor layer, the memory columnar body containing a second semiconductor layer in a columnar shape having a side face opposite to a side face of the conductive layer, a first portion of the first semiconductor layer in contact with the side face of the memory columnar body containing a donor in a higher concentration than a second portion different from the first portion of the first semiconductor layer.
地址 Minato-ku JP