发明名称 |
LATERAL POWER MOSFET WITH NON-HORIZONTAL RESURF STRUCTURE |
摘要 |
In one embodiment, a RESURF structure between a source and a drain in a lateral MOSFET is formed in a trench having a flat bottom surface and angled sidewalls toward the source. Alternating P and N-type layers are epitaxially grown in the trench, and their charges balanced to achieve a high breakdown voltage. In the area of the source, the ends of the P and N-layers angle upward to the surface under the lateral gate and contact the body region. Thus, for an N-channel MOSFET, a positive gate voltage above the threshold forms a channel between the source and the N-layers in the RESURF structure as well as creates an inversion of the ends of the P-layers near the surface for low on-resistance. In another embodiment, the RESURF structure is vertically corrugated by being formed around trenches, thus extending the length of the RESURF structure for a higher breakdown voltage. |
申请公布号 |
US2017077221(A1) |
申请公布日期 |
2017.03.16 |
申请号 |
US201615202227 |
申请日期 |
2016.07.05 |
申请人 |
MaxPower Semiconductor, Inc. |
发明人 |
Yilmaz Hamza;Darwish Mohamed N.;Blanchard Richard A. |
分类号 |
H01L29/06;H01L27/02;H01L29/739;H01L27/06;H01L29/10;H01L29/78 |
主分类号 |
H01L29/06 |
代理机构 |
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代理人 |
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主权项 |
1. A lateral insulated gate transistor formed in a semiconductor substrate comprising:
a first region of a first conductivity type; a second region of the first conductivity type; a body region of a second conductivity type; a lateral gate insulated from and overlying at least a portion of the body region; and a Reduced Surface Field (RESURF) structure comprising alternating layers of a first material of the first conductivity type and a second material of the second conductivity type, the alternating layers in a first portion of the RESURF structure running generally parallel to a top surface of the substrate toward the second region, and alternating layers in a second portion of the RESURF structure inclining upward toward the gate such that ends of the alternating layers face the gate, wherein the transistor is configured such that, upon a threshold voltage being applied to the gate, a conductive channel is formed in the body region by inversion of the body region under the gate, such that a current flows between the first region and the second region through the RESURF structure. |
地址 |
San Jose CA US |