发明名称 APPARATUS AND METHOD FOR ELECTROSTATIC SPRAYING OR ELECTROSTATIC COATING OF A THIN FILM
摘要 Provided is a resist film forming device which uses an electrostatic spray device which is capable of forming a thin film with a uniform thickness on a workpiece. A resist film forming device (100), which forms a resist film (108) on a substrate by electrostatic spraying, comprises: a nozzle (102) which, upon application of a prescribed voltage, sprays liquid particles which form the raw material for a resist film (108) toward a substrate (105) having stepped portions (105a); a driving means (111) for causing relative movement of the substrate (105) or the nozzle (102); and a control means (110) for controlling such that the resist film (108) is formed on the substrate (105) having the stepped portions (105a) by the liquid particles.
申请公布号 US2017077042(A1) 申请公布日期 2017.03.16
申请号 US201615362258 申请日期 2016.11.28
申请人 Apic Yamada Corporation 发明人 KOBAYASHI Kazuhiko;SUDA Keisuke
分类号 H01L23/552;H01L21/3205;H01L23/00;H01L21/326 主分类号 H01L23/552
代理机构 代理人
主权项 1. An insulating film forming method for forming an insulating film on a work by electrostatic spraying or electrostatic coating, comprising: applying a prescribed voltage to a nozzle; spraying or applying particles of a liquid agent as ingredients of the insulating film from the nozzle toward or to the work; and forming the insulating film on the work using the particles of the liquid agent.
地址 Nagano JP