发明名称 |
APPARATUS AND METHOD FOR ELECTROSTATIC SPRAYING OR ELECTROSTATIC COATING OF A THIN FILM |
摘要 |
Provided is a resist film forming device which uses an electrostatic spray device which is capable of forming a thin film with a uniform thickness on a workpiece. A resist film forming device (100), which forms a resist film (108) on a substrate by electrostatic spraying, comprises: a nozzle (102) which, upon application of a prescribed voltage, sprays liquid particles which form the raw material for a resist film (108) toward a substrate (105) having stepped portions (105a); a driving means (111) for causing relative movement of the substrate (105) or the nozzle (102); and a control means (110) for controlling such that the resist film (108) is formed on the substrate (105) having the stepped portions (105a) by the liquid particles. |
申请公布号 |
US2017077042(A1) |
申请公布日期 |
2017.03.16 |
申请号 |
US201615362258 |
申请日期 |
2016.11.28 |
申请人 |
Apic Yamada Corporation |
发明人 |
KOBAYASHI Kazuhiko;SUDA Keisuke |
分类号 |
H01L23/552;H01L21/3205;H01L23/00;H01L21/326 |
主分类号 |
H01L23/552 |
代理机构 |
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代理人 |
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主权项 |
1. An insulating film forming method for forming an insulating film on a work by electrostatic spraying or electrostatic coating, comprising:
applying a prescribed voltage to a nozzle; spraying or applying particles of a liquid agent as ingredients of the insulating film from the nozzle toward or to the work; and forming the insulating film on the work using the particles of the liquid agent. |
地址 |
Nagano JP |