EBEAM ALIGN ON THE FLY

摘要

Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a method of real-time alignment of a wafer situated on a stage of an e-beam tool involves collecting backscattered electrons from an underlying patterned feature of the wafer while an e-beam column of the e-beam tool writes during scanning of the stage. The collecting is performed by an electron detector placed at the e-beam column bottom. The method also involves performing linear corrections of an alignment of the stage relative to the e-beam column based on the collecting.

主权项

1. A method of real-time alignment of a wafer situated on a stage of an e-beam tool, the method comprising:
collecting backscattered electrons from an underlying patterned feature of the wafer while an e-beam column of the e-beam tool writes during scanning of the stage, the collecting performed by an electron detector placed at the e-beam column bottom; and performing corrections of an alignment of the stage relative to the e-beam column based on the collecting.