| 主权项 |
1. A heat treatment apparatus, comprising:
a substantially-cylindrical reaction tube extending in a vertical direction, and configured to accommodate a substrate holder in which a plurality of substrates is stacked in the vertical direction; a gas supply duct integrally formed with the reaction tube on an outer circumferential wall of the reaction tube to extend in a longitudinal direction of the reaction tube; gas supply holes formed in a region of the outer circumferential wall of the reaction tube covered with the gas supply duct, and configured to bring an interior of the gas supply duct and an interior of the reaction tube into communication with each other; a preheating duct communicating with the gas supply duct, integrally formed with the reaction tube on the outer circumferential wall of the reaction tube, and installed so as to extend along the longitudinal direction of the reaction tube up to a predetermined position of a predetermined height existing in the vicinity of an upper end of the outer circumferential wall of the reaction tube; and a pressure-resistant container configured to cover the reaction tube, the gas supply duct and the preheating duct from the outside. |
