CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD

摘要

A chemically amplified resist material comprises: a polymer component that is capable of being made soluble or insoluble in a developer solution by an action of an acid; and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The polymer component comprises: a first polymer comprising a first structural unit that comprises a fluorine atom and does not comprise a salt structure; or a second polymer comprising a second structural unit that comprises a fluorine atom and a salt structure. The generative component comprises: a radiation-sensitive acid-and-sensitizer generating agent; any two of the radiation-sensitive acid-and-sensitizer generating agent, a radiation-sensitive sensitizer generating agent and a radiation-sensitive acid generating agent; or the radiation-sensitive acid-and-sensitizer generating agent, the radiation-sensitive sensitizer generating agent and the radiation-sensitive acid generating agent.

主权项

1. A chemically amplified resist material comprising:
a polymer component that is capable of being made soluble or insoluble in a developer solution by an action of an acid; and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure, wherein the polymer component comprises:
a first polymer comprising a first structural unit that comprises a fluorine atom and does not comprise a salt structure; ora second polymer comprising a second structural unit that comprises a fluorine atom and a salt structure, and wherein the generative component comprises:
a radiation-sensitive acid-and-sensitizer generating agent;any two of the radiation-sensitive acid-and-sensitizer generating agent, a radiation-sensitive sensitizer generating agent and a radiation-sensitive acid generating agent; orthe radiation-sensitive acid-and-sensitizer generating agent, the radiation-sensitive sensitizer generating agent and the radiation-sensitive acid generating agent,whereinthe radiation-sensitive acid-and-sensitizer generating agent is capable of generating, by an action of a first radioactive ray that is a radioactive ray having a wavelength of no greater than 250 nm, an acid, and a radiation-sensitive sensitizer absorbing a second radioactive ray that is a radioactive ray having a wavelength of greater than 250 nm, and substantially does not generate the acid and the radiation-sensitive sensitizer upon an exposure to the second radioactive ray without an exposure to the first radioactive ray,the radiation-sensitive sensitizer generating agent is capable of generating, upon the exposure to the first radioactive ray, the radiation-sensitive sensitizer absorbing the second radioactive ray, and substantially does not generate the radiation-sensitive sensitizer upon the exposure to the second radioactive ray without the exposure to the first radioactive ray, andthe radiation-sensitive acid generating agent is capable of generating an acid upon the exposure to the first radioactive ray, and substantially does not generate the acid upon the exposure to the second radioactive ray without the exposure to the first radioactive ray.