| 发明名称 |
TIN PULL-BACK AND CLEANING COMPOSITION |
| 摘要 |
The present invention relates to a novel composition that may be used to control the etching rate of TIN with respect to W, and remove any residues from the surface, e.g. organic or inorganic residues that could contain fluorine (F), which composition comprises a) an aliphatic or aromatic sulfonic acid; b) one or more inhibitor(s); c) an aprotic solvent; d) a glycol ether; and e) water. The present invention also relates to a kit comprising said composition in combination with an oxidant and optionally a stabilizer of the oxidant, and the use thereof. |
| 申请公布号 |
US2017076939(A1) |
申请公布日期 |
2017.03.16 |
| 申请号 |
US201515310647 |
申请日期 |
2015.05.12 |
| 申请人 |
BASF SE |
发明人 |
KE Jerry Jhih-Jheng;YU Tse Wei;CHENG Yi-Ping |
| 分类号 |
H01L21/02;C11D3/37;C11D3/39;H01L21/311;C11D7/32;C11D7/34;C11D7/50;C09K13/00;C11D11/00;C11D7/26 |
主分类号 |
H01L21/02 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A composition, comprising:
a) an aliphatic or aromatic sulfonic acid; b) at least one inhibitor; c) an aprotic solvent; d) a glycol ether; and e) water. |
| 地址 |
Ludwigshafen DE |
