发明名称 SURFACE POSITION DETECTION APPARATUS, EXPOSURE APPARATUS, AND EXPOSURE METHOD
摘要 A surface position detection apparatus capable of highly precisely detecting the surface position of a surface to be detected without substantially being affected by relative positional displacement due to a polarization component occurring in a light flux having passed through a reflective surface. In the apparatus, a projection system has a projection side prism member having first reflective surfaces, and a light receiving system has a light receiving prism member having second reflective surfaces arranged in correspondence with the projection side prism member. The surface position detection apparatus further has a member for compensating relative positional displacement due to a polarization component of a light flux having passed through the first and second reflective surfaces.
申请公布号 US2017075227(A1) 申请公布日期 2017.03.16
申请号 US201615358837 申请日期 2016.11.22
申请人 NIKON CORPORATION 发明人 HIDAKA Yasuhiro;NAGAYAMA Tadashi
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
主权项 1. An exposure apparatus which exposes a substrate to exposure light, the apparatus comprising: a holder which holds the substrate; and a position detection apparatus which detects a position of a surface of the substrate held by the holder, with respect to a direction intersecting the surface, on the basis of a light receiving result of a light beam which is guided to the surface in a diagonal direction relative to the surface and is reflected by the surface, the position detection apparatus comprising: a first reflection member which reflects the light beam, the first reflection member being arranged in an optical path of the light beam on an incidence side relative to the surface of the substrate held by the holder; a second reflection member which reflects the light beam from the surface, the second reflection member being arranged in the optical path of the light beam on a reflection side relative to the surface of the substrate held by the holder; and a polarizing member arranged in the optical path of the light beam between the first reflection member and the second reflection member, which changes polarization direction of each of a first polarization component and a second polarization component of the light beam from the first reflecting member, the polarization directions of which are perpendicular to each other, to the polarization direction of the respective other polarization component.
地址 Tokyo JP