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1. A resist composition comprising a base polymer and a sulfonium salt having the formula (A): wherein R1 is hydrogen or a straight, branched or cyclic C1-C6 alkyl group,
R2 is selected from the group consisting of hydrogen, straight, branched or cyclic C1-C6 alkyl, acetyl, methoxycarbonyl, ethoxycarbonyl, n-propyloxycarbonyl, isopropyloxycarbonyl, t-butoxycarbonyl, t-pentyloxycarbonyl, methylcyclopentyloxycarbonyl, ethylcyclopentyloxycarbonyl, methylcyclohexyloxycarbonyl, ethylcyclohexyloxycarbonyl, 9-fluorenylmethyloxycarbonyl, allyloxycarbonyl, phenyl, benzyl, naphthyl, naphthylmethyl, methoxymethyl, ethoxymethyl, propoxymethyl, and butoxymethyl,R3 and R4 are each independently hydrogen, or a straight, branched or cyclic C1-C12 alkyl group, C6-C20 aryl group, C2-C12 alkenyl group or C2-C12, alkynyl group which may contain an ester, ether, sulfide, sulfoxide, sulfone, halogen, amino, amide, hydroxy, thiol or nitro moiety, R3 and R4, taken together, may form a double bond, with the proviso that the total number of carbon atoms in R1 to R4 is at least 7 when R3 and R4 are free of fluorine, and the total number of carbon atoms in R1 to R4 is at least 1 when R3 and R4 contain fluorine,R5, R6 and R7 are each independently a straight, branched or cyclic C1-C12 alkyl or oxoalkyl group, a straight, branched or cyclic C2-C12 alkenyl or oxoalkenyl group, C6-C20 aryl group, or C7-C12 aralkyl or aryloxoalkyl group, in which at least one hydrogen may be substituted by a substituent containing an ether, ester, carbonyl, carbonate, hydroxyl, carboxyl, halogen, cyano, amide, nitro, sultone, sulfonic acid ester, sulfone moiety or sulfonium salt, or R5 and R6 may bond together to form a ring with the sulfur atom to which they are attached. |
