发明名称 基板処理装置および基板処理列制御方法
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing apparatus in which a plurality of substrate processing sections can be operated and stopped easily and individually, without changing the transfer order information, and to provide a substrate processing section control method.SOLUTION: A substrate processing apparatus 1 includes a plurality of substrate processing lines 5, 6, and a control unit 31 for controlling the plurality of substrate processing lines 5, 6. The substrate processing lines 5, 6 have a plurality of processing units, and main transfer mechanisms T, Tfor transferring substrates to the processing units. Based on the flow recipe FR for defining the order of processing units to which the substrates are transferred, and the selection information SL for selecting a substrate processing line to be operated, the control unit 31 operates a substrate processing line selected by the selection information SL exactly according to the flow recipe FR, and stops the substrate processing line not selected by the selection information SL.
申请公布号 JP6097569(B2) 申请公布日期 2017.03.15
申请号 JP20130006558 申请日期 2013.01.17
申请人 株式会社SCREENセミコンダクターソリューションズ 发明人 桐田 将司
分类号 H01L21/677;H01L21/02 主分类号 H01L21/677
代理机构 代理人
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