发明名称 CONDUCTIVE INTERCONNECT STRUCTURES INCORPORATING NEGATIVE THERMAL EXPANSION MATERIALS AND ASSOCIATED SYSTEMS, DEVICES, AND METHODS
摘要 Semiconductor devices having interconnects incorporating negative expansion (NTE) materials are disclosed herein. In one embodiment a semiconductor device includes a substrate having an opening that extends at least partially through the substrate. A conductive material having a positive coefficient of thermal expansion (CTE) partially fills the opening. A negative thermal expansion (NTE) having a negative CTE also partially fills the opening. In one embodiment, the conductive material includes copper and the NTE material includes zirconium tungstate.
申请公布号 EP3031075(A4) 申请公布日期 2017.03.15
申请号 EP20140834233 申请日期 2014.07.30
申请人 Micron Technology, Inc. 发明人 LI, Hongqi;JINDAL, Anurag;LU, Jin;RAMALINGAM, Shyam
分类号 H01L23/48;H01L21/768 主分类号 H01L23/48
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