| 摘要 |
Process variation-based model optimization for metrology is described. For example, a method includes determining a first model of a structure. The first model is based on a first set of parameters. A set of process variations data is determined for the structure. The first model of the structure is modified to provide a second model of the structure based on the set of process variations data. The second model of the structure is based on a second set of parameters different from the first set of parameters. A simulated spectrum derived from the second model of the structure is then provided. |
