| 摘要 |
PROBLEM TO BE SOLVED: To provide a styrene-based polymer solution which produces no residue on a substrate after development when a coating film for alkali development is formed from the solution and which can be suitably used for forming a coating film such as a photosensitive resin composition, a coating agent and a coating material.SOLUTION: The styrene-based polymer solution contains a styrene-based polymer, in which the styrene-based polymer is a styrene-based polymer produced by polymerizing a monomer component comprising a styrene monomer and an ether monomer expressed by formula (I), and the content percentage of the styrene-based monomer is 0.8 wt.% or less. In the formula, Rand Reach independently represent a hydrogen atom or a hydrocarbon group having 1 to 25 carbon atoms which may have a substituent. |
