发明名称 イオンビーム照射装置
摘要 PROBLEM TO BE SOLVED: To provide an ion beam irradiator which can always cool a substrate to a very low temperature of -60°C through -100°C, for example, while cooling the substrate by using a refrigerant, without impairing the flexibility of resin piping for distributing the refrigerant, and can move the substrate freely during ion beam irradiation.SOLUTION: An ion beam irradiator includes a first cooling mechanism 5 including a heat exchange section 5A where heat exchange takes place between a substrate W and a refrigerant, and flexible resin piping 5B for distributing the refrigerant to the heat exchange section 5A, a second cooling mechanism 6 for cooling the substrate W by heat transfer, and a cooling mechanism control unit 7 for cooling the substrate W by the second cooling mechanism 6, while distributing the refrigerant having a temperature higher than a cold temperature limit to the resin piping 5B, at least when the target substrate cooling temperature of the substrate W is equal to or lower than the cold temperature limit of the resin piping 5B.
申请公布号 JP6094800(B2) 申请公布日期 2017.03.15
申请号 JP20130033797 申请日期 2013.02.22
申请人 日新イオン機器株式会社 发明人 田中 浩平
分类号 H01L21/265 主分类号 H01L21/265
代理机构 代理人
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