发明名称 円筒型スパッタリングターゲット及びその製造方法
摘要 PROBLEM TO BE SOLVED: To enhance junction property between a cylindrical substrate and a cylindrical sputtering target material.SOLUTION: A cylindrical sputtering target is a combined body of a cylindrical substrate and a cylindrical sputtering target material. In the cylindrical sputtering target, a ten-point average roughness (Rz) of the cylindrical sputtering target material at a side of a junction material to combine the cylindrical substrate and the cylindrical sputtering material satisfies the following expression: d(μm)×α(μm/μmK)×ΔT(K)≤Rz(μm), where dμm is a thickness of the junction material, α(μm/μmK) is a linear coefficient of expansion of an adhesive agent and ΔT(K) is a difference between a melting point of the adhesive agent and a room temperature.SELECTED DRAWING: Figure 2
申请公布号 JP6095824(B2) 申请公布日期 2017.03.15
申请号 JP20160059703 申请日期 2016.03.24
申请人 JX金属株式会社 发明人 鶴田 好孝
分类号 C23C14/34;C04B37/02 主分类号 C23C14/34
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