发明名称 ARTICLE TREATMENT METHODS
摘要 An article (100) treatment method includes providing the article (100) including a substrate (102) composed of a substrate material (104) having an undesirable substrate feature (106). The undesirable substrate feature (106) may include a recess (112), and a portion of the substrate (102) containing the undesirable substrate feature (106) may be removed to form a recess (112) in a surface (108) of the substrate (102). A feedstock mixture (304) including a filler material (302) and a liquid carrier (306) is introduced into an HVAF apparatus (300) having a combustion gas stream (308) with a temperature greater than the melting point of the filler material (302). The filler material (302) is applied to the recess (112) by expelling the filler material (302) while maintained at a temperature less than the melting point of the filler material (302) by the liquid carrier (306). The filler material (302) and an area of the substrate (102) bordering the recess (112) are heat treated, forming a treated portion (400).
申请公布号 EP3141629(A1) 申请公布日期 2017.03.15
申请号 EP20160186508 申请日期 2016.08.31
申请人 General Electric Company 发明人 SCHAEFFER, Jon Conrad;DETOR, Andrew Joseph
分类号 C23C4/129;C23C4/01;C23C4/18;C23C24/04;F01D5/00 主分类号 C23C4/129
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