| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition satisfying line edge roughness (LER) during production of a resist pattern.SOLUTION: A salt comprises an anion containing a group to cleave by the action of an alkali developing solution and a cation containing a group to cleave by the action of the alkali developing solution. An acid generator comprises the salt as an active ingredient. A resist composition comprises the acid generator and a resin in which the resin contains a group unstable to an acid, is insoluble or sparingly-soluble in an alkali aqueous solution and acts on an acid to be dissolved in the alkali aqueous solution. |
