IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD

摘要

An imprint apparatus for forming a pattern of an imprint material on a substrate using a mold, includes a driving unit configured to adjust a distance and a relative tilt between the mold and the substrate, an image capturing unit configured to capture a plurality of times an interference fringe formed by illuminating the substrate via the mold in a process of enlarging a contact area between the mold and the imprint material by reducing the distance between the mold and the substrate by the driving unit, and a control unit configured to control the driving unit so as to correct the relative tilt between the mold and the substrate a plurality of times in the process based on images captured by the image capturing unit a plurality of times.