| 摘要 |
Method and apparatus for manufacturing a barrier layer (1b) on a substrate. The apparatus comprises an atmospheric pressure glow discharge (APGD) plasma apparatus having at least two electrodes (2, 3) arranged to generate an atmospheric pressure glow discharge plasma in a treatment space (5) formed between said two electrodes (2, 3), and an atomic layer deposition (ALD) device. The apparatus is arranged to provide an inorganic oxide layer (1a) on the substrate (1) using the atmospheric pressure glow discharge (APGD) plasma apparatus, and to provide a consecutive deposition (1b) of between 1 and 70 atomic layers on the inorganic oxide layer (1a) using the ALD device. The result is a flexible barrier substrate having excellent water vapor transmission ratio, which is able to be manufactured efficiently. |
