| 摘要 |
The present invention provides an imprint apparatus including a control unit configured to perform detection process, wherein the detection process includes first process in which a detection optical system is caused to detect a mold-side mark in a state in which a substrate state is positioned such that a reference mark is located outside the field of view of the detection optical system, and second process in which the detection optical system is caused to detect the reference mark in a state in which the mold stage is positioned such that the mold-side mark is out of focus with respect to the detection optical system, and the substrate stage is positioned such that the reference mark is located inside the field of view of the detection optical system. |
