Method for producing an optical component of synthetic quartz glass with enhanced radiation resistance, and blank for producing the component

摘要

In a multi-stage temperature-control process to prepare an optical component from synthetic quartz glass, the glass blank is processed while at a temperature in the range 1130[deg] C and 1230 [deg] C. The hot blank is then cooled at a moderately fast rate to below 1100[deg] C and then quenched, with the quartz glass at a fictive temperature of 1100[deg] C or more. In a second treatment stage the quartz glass is cooled relatively slowly and then treated at a temperature between 950 and 1100[deg] C and processed at a fictive temperature which is at least 50[deg] C lower than the higher average value in the first stage.