| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate holding device which prevents foreign objects such as abrasion powder from falling on a polishing surface and enables a retainer ring to uniformly apply a predetermined pressing force to the polishing surface.SOLUTION: A substrate holding device includes: a top ring body 10 which holds an elastic film for pressing a substrate to a polishing surface; a retainer ring 20 which is disposed so as to enclose the substrate and contacts with the polishing surface; and a spherical bearing 111 tiltably supporting the retainer ring 20. A center of tiling of the retainer ring 20 lies below the spherical bearing 111.SELECTED DRAWING: Figure 2 |
