| 摘要 |
A photomask blank comprising a transparent substrate (1) and a chromium-containing film (2) is provided. The chromium-containing film is formed of a chromium compound containing Cr, N, and optionally O, has a total Cr+N+O content ‰¥ 93 at%, and meets the formula: 3cry ‰¤ 20 + 3N. A chromium compound layer meeting a first composition having a N/Cr atomic ratio ‰¥ 0.95, a Cr content ‰¥ 40 at%, a Cr+N content ‰¥ 80 at%, and an O contents ‰¤ 10 at% accounts for 10-70% of the overall thickness of the chromium-containing film. |
