| 摘要 |
PROBLEM TO BE SOLVED: To provide a photomask with which a fine pattern can be accurately and precisely transferred, and to provide a transfer method and a method for manufacturing a flat panel display.SOLUTION: The photomask has a transfer pattern formed on a transparent substrate, wherein the transfer pattern includes a light-shielding part that blocks at least a part of exposure light and a light-transmitting part exposing the transparent substrate. The light-shielding part includes an edge region formed along an outer periphery of the light-shielding part with a predetermined width, and a center region formed in a part except for the edge region of the light-shielding part. The center region is formed to give an about 180 degrees of a phase shift amount to light at a representative wavelength included in the exposure light that transmits through the light-transmitting part, while the edge region is formed to give a phase shift amount smaller than that of the center region to the light at the representative wavelength. An optical film having 50% or less of a transmittance with respect to the light at the representative wavelength is formed in the edge region. |
