发明名称 減圧乾燥装置および減圧乾燥方法
摘要 The invention provides a decompression drying device and a decompression drying method. In the decompression drying device, after the decompression drying process, a gas supply port (of one side) can be used to supply the nitrogen to the chamber, and the gas supply port is provided with an opening facing toward the space area of the side of the horizontal direction (+Y side) by viewing from a central position of a substrate. After the gas supply, the positive pressure environment can be formed in the space of the +Y side of the gas support port. The gas flow AF2 generated by the gas supply in the chamber, the gas flow flowing on the first main surface of the substrate can be the unidirectional gas flow from the +Y side to the -Y side. The possibility of the pressure concentration area generated on the first main surface of the substrate can be reduced. The drop of the solvent generated on the pressure concentration area can be less possibly attached to the residuals on the first surface of the substrate.
申请公布号 JP6093172(B2) 申请公布日期 2017.03.08
申请号 JP20120282860 申请日期 2012.12.26
申请人 株式会社SCREENホールディングス 发明人 柿村 崇
分类号 F26B5/04;G03F7/38;H01L21/027 主分类号 F26B5/04
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