发明名称 剥離用組成物、剥離用組成物の製造方法、及びその利用
摘要 PROBLEM TO BE SOLVED: To provide a peeling composition capable of reducing generation of a liquid trace residue on a surface of a substrate after peeling a support plate.SOLUTION: A peeling composition includes a solvent for dissolving an adhesive bonding a support plate to a substrate so as to peel the substrate from the support plate, and a content of high boiling point impurities having a boiling point higher by 25°C or more than a boiling point of the solvent is 5 wt.% or less.
申请公布号 JP6093187(B2) 申请公布日期 2017.03.08
申请号 JP20130004963 申请日期 2013.01.15
申请人 東京応化工業株式会社 发明人 吉岡 孝広;久保 安通史;今井 洋文
分类号 C09J5/00;C09J201/00;C11D7/50;H01L21/301;H01L21/304 主分类号 C09J5/00
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