| 摘要 |
Provided is a film deposition device including a DMS target and a film-deposition power source, being capable of pre-sputtering the target by use of the film-deposition power source. The film deposition device includes: a film deposition chamber (10); first and second cathodes (20A, 20B) each having a target (24) and disposed next to each other in such an attitude that target surfaces (24a) faces a substrate in the film deposition chamber (10); a magnetic-field formation unit (30) forming a magnetic field in the vicinity of the surfaces (24a) of both targets (24); a film-deposition power source (40) connected to both of the cathodes (20A, 20B); and a shutter (50). The shutter (50) makes an opening-closing action between a close portion at which the shutter (50) is interposed between the substrate and the target surfaces (24a) of both cathodes to block the target surfaces (24a) collectively from the substrate and an open position to allow film deposition on the substrate through opening the space between the target surfaces (24a) and the substrate. |
