发明名称 Deposition apparatus, method for forming thin film using the same, organic light emitting display apparatus and method for manufacturing the same
摘要 A deposition apparatus is configured to form a deposition layer on a substrate. The deposition apparatus includes a deposition source configured to face a first side of the substrate and to spray one or more depositing materials toward the substrate, a cooling stage configured to support a second side of the substrate that is opposite from the first side of the substrate, and a hardening unit configured to harden the one or more depositing materials sprayed from the deposition source and that have reached the substrate. A method of forming a thin film deposition layer on a substrate by using a deposition apparatus is also provided. The method includes spraying one or more depositing materials toward the substrate by using a deposition source of the deposition apparatus while the substrate is on a cooling stage of the deposition apparatus.
申请公布号 US9590207(B2) 申请公布日期 2017.03.07
申请号 US201615073354 申请日期 2016.03.17
申请人 Samsung Display Co., Ltd. 发明人 Huh Myung-Soo;Kim Sun-Ho;Joo Hyun-Woo;Kim Jae-Hyun
分类号 H01L51/52;H01L51/56;H01L51/00;H01L27/32;H01L51/50 主分类号 H01L51/52
代理机构 Lewis Roca Rothgerber Christie LLP 代理人 Lewis Roca Rothgerber Christie LLP
主权项 1. A deposition apparatus configured to form a deposition layer on a substrate, the deposition apparatus comprising: a deposition source configured to face a first side of the substrate and to spray one or more depositing materials toward the substrate; a cooling stage configured to support a second side of the substrate that is opposite from the first side of the substrate; and a hardening unit configured to harden the one or more depositing materials sprayed from the deposition source and that have reached the substrate.
地址 Yongin-si KR